9 June 1995 Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation
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Abstract
This study evaluates the effect of dyes, including photosensitive dyes, on resist performance such as: swing curve reduction, resist dissolution rate, resolution, dose and focus latitude, scumming, etc. The paper demonstrates good correlation between modeling of the dyed resist performance and experimental results.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Marina V. Plat, William R. Brunsvold, Randolph S. Smith, Nicholas K. Eib, Christopher F. Lyons, "Formulation and modeling of dyed positive i-line resist for control of the reflective notching and CD variation", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); doi: 10.1117/12.210348; https://doi.org/10.1117/12.210348
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