Paper
9 June 1995 Molecular simulation of photoresists II: application to PAC diffusion
Andrew J. Blakeney, Lawrence Ferreira, Medhat A. Toukhy, Patricia Morra, Nicholas M. Reynolds
Author Affiliations +
Abstract
Recent advances in computer hardware and software have provided the capability to simulate complex mixtures of compounds on a molecular level. These tools provide the potential for exploration of resist chemistry and mechanism on a molecular level with visual feedback. Molecular simulations of a DNQ novolac resist were used in an unsuccessful attempt to visualize and study PAC diffusion during PEB. Simulation of PAC molecules allowed the calculation of the Connolly surface and hence the volume of space occupied by the PAC molecule. A reasonable correlation of the Connolly volume with the decrease in standing waves after PEB as measured from DRM curves was observed. This supports a PAC diffusion mechanism for PEB reduction of standing waves.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Andrew J. Blakeney, Lawrence Ferreira, Medhat A. Toukhy, Patricia Morra, and Nicholas M. Reynolds "Molecular simulation of photoresists II: application to PAC diffusion", Proc. SPIE 2438, Advances in Resist Technology and Processing XII, (9 June 1995); https://doi.org/10.1117/12.210388
Lens.org Logo
CITATIONS
Cited by 1 scholarly publication.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Picture Archiving and Communication System

Diffusion

Molecules

Visualization

Computer simulations

Polymers

Chemical species

Back to Top