22 May 1995 Lithography simulation of contamination-caused defects
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Lithography is the critical process for developing smaller and more dimensionally accurate semiconductor structures more reliably. Many random defects are caused by contamination particles during the lithographic process. Several models have predicted yield loss associated with defect density and particle size. Although some have taken into account the defect growth mechanisms, a more accurate simulator is needed to provide the transformation from the contamination to the defect level. In this paper, the contamination to defect transformation is investigated using the 2D lithographic simulator, METROPOLE. A study is presented that characterizes the effects of particle size, location and composition on the formation of lithographic defects for a 2D metal line structure. Particle characterization and parameterization is carried out for a number of common conditions including different light polarizations, defocus, and nonplanarities. The simulations are checked against defect data from AMD Sunnyvale.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher E. Novak, Christopher E. Novak, Kevin D. Lucas, Kevin D. Lucas, Andrzej J. Strojwas, Andrzej J. Strojwas, Zhi-Min Ling, Zhi-Min Ling, } "Lithography simulation of contamination-caused defects", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); doi: 10.1117/12.209202; https://doi.org/10.1117/12.209202

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