22 May 1995 Measuring system XY-5i
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The progress of integration in semiconductor (LSI) is remarkable. We expect that the mass-production of 256M DRAM shall start in the next few years. The design rules for this level of integration will require even more accurately in a system to measure a reticle pattern's position. To meet the measurement requirements for future IC designs, Nikon Corporation has developed to XY-5i. During development, we introduced some new technologies to improve the systems' measurement performance. In this paper, we will explain the new flexure compensation concept and the reduction of measurement error caused by temperature drift. These are the key technologies used to attain the improved performance. This performance will be demonstrated with actual measurement data from the XY-5i.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kennichi Kodama, Kennichi Kodama, Eiji Matsubara, Eiji Matsubara, } "Measuring system XY-5i", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); doi: 10.1117/12.209194; https://doi.org/10.1117/12.209194

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