Metrology with the ultraviolet scanning transmission microscope

Richard M. Silver; James E. Potzick; J. Y-Chien Hu

doi:10.1117/12.209228

22 May 1995 Metrology with the ultraviolet scanning transmission microscope

Richard M. Silver, James E. Potzick, J. Y-Chien Hu

Proceedings Volume 2439, Integrated Circuit Metrology, Inspection, and Process Control IX; (1995) https://doi.org/10.1117/12.209228
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

A novel design for an ultraviolet critical dimension measurement transmission microscope utilizing the Stewart platform as the rigid main structure has been implemented. This new design shows improved vibration characteristics and is able to accommodate large specimens. We present alignment procedures and their relevance to obtaining accurate linewidth measurements. Initial measurements with the new system comparing visible and ultraviolet wavelength illumination show expected characteristic dependence of the intensity image as a function of wavelength.

Citation Download Citation

Richard M. Silver, James E. Potzick, and J. Y-Chien Hu "Metrology with the ultraviolet scanning transmission microscope", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); https://doi.org/10.1117/12.209228

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