22 May 1995 Multimode electron beam imaging and metrology
Author Affiliations +
In this work, we address the 0.25 micrometers yield management applications of multimode electron beam imaging using both backscattered and secondary electrons. The prospects for achieving aggressive performance specifications for quarter-micrometer process control in imaging, metrology and productivity are analyzed, and supporting examples are provided.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin M. Monahan, Kevin M. Monahan, } "Multimode electron beam imaging and metrology", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); doi: 10.1117/12.209217; https://doi.org/10.1117/12.209217

Back to Top