22 May 1995 Multimode electron beam imaging and metrology
Author Affiliations +
Abstract
In this work, we address the 0.25 micrometers yield management applications of multimode electron beam imaging using both backscattered and secondary electrons. The prospects for achieving aggressive performance specifications for quarter-micrometer process control in imaging, metrology and productivity are analyzed, and supporting examples are provided.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kevin M. Monahan, Kevin M. Monahan, } "Multimode electron beam imaging and metrology", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); doi: 10.1117/12.209217; https://doi.org/10.1117/12.209217
PROCEEDINGS
9 PAGES


SHARE
Back to Top