SEMI standards programmed defect masks and its application for defect inspection

Hiroichi Kawahira; Yoshiki Suzuki

doi:10.1117/12.209201

22 May 1995 SEMI standards programmed defect masks and its application for defect inspection

Hiroichi Kawahira, Yoshiki Suzuki

Proceedings Volume 2439, Integrated Circuit Metrology, Inspection, and Process Control IX; (1995) https://doi.org/10.1117/12.209201
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

A set of test masks on which programmed defects are placed has been standardized by SEMI (SEMI Standards P23-93). The masks have been designed to be used for benchmarking the sensitivity of defect inspection systems for reticles and masks. The standard test vehicles consist of two types of masks which have quasi device background patterns (contact holes or through-holes and wiring patterns) with a wide variety of programmed defects. The geometry of the background patterns on the masks have been designed for 0.5 micrometers or less when printed on a wafer with a 5x reduction stepper. Under the coordination of SEMI Japan, the test masks have experimentally been fabricated by a couple of Japanese mask shops, and the masks fabricated have been evaluated focusing on defect sizing accuracy. The mask which has holes as background pattern has been used for defect printability study using a 5x reduction i-line stepper. As a result, it has been confirmed that the test mask is a useful vehicle for the study. The standard masks, therefore, can also be used to make a standard defect spec on which mask suppliers and users agree.

Citation Download Citation

Hiroichi Kawahira and Yoshiki Suzuki "SEMI standards programmed defect masks and its application for defect inspection", Proc. SPIE 2439, Integrated Circuit Metrology, Inspection, and Process Control IX, (22 May 1995); https://doi.org/10.1117/12.209201

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