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Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd:YAG laser
Feature biasing versus feature-assisted lithography: a comparison of proximity correction methods for 0.5*(lambda/NA) lithography
Three-dimensional reflective-notching simulation using multipole-accelerated physical optics approximation
Relative merits of using maximum error versus 3(sigma) in describing the performance of laser-exposure reticle writing systems
Antireflection coating process characterization and improvement for DUV lithography at 0.25 um: ground rules
Effect of resist surface insoluble layer in attenuated phase-shift mask for window pattern formation