26 May 1995 Automated layout of mask assist-features for realizing 0.5 k1 ASIC lithography
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Abstract
The virtues of mask-plane assist features for improving imaging performance of generic ASIC layouts in the 0.5k1 realm has been previously proclaimed. In this report we provide experimental verification and introduce a methodology to automatically deploy these features on ASIC layouts.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Joseph G. Garofalo, Joseph G. Garofalo, Oberdan W. Otto, Oberdan W. Otto, Raymond A. Cirelli, Raymond A. Cirelli, Robert L. Kostelak, Robert L. Kostelak, Sheila Vaidya, Sheila Vaidya, } "Automated layout of mask assist-features for realizing 0.5 k1 ASIC lithography", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209262; https://doi.org/10.1117/12.209262
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