26 May 1995 Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd:YAG laser
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Abstract
A new lithography technique using continuous wave (CW) 266 nm radiation from an all solid state frequency quadrupled Nd:YAG laser is described and demonstrated. This laser has proved to be a highly efficient and promising deep UV light source in fabrication of 0.25 micron design rule device. Furthermore, we obtained 0.2 micron L/S pattern with phase shift mask. Speckle free images are obtained with rotating diffuser. The performance and potential of this new laser as a light source of microlithography are discussed and compared with KrF excimer laser theoretically and experimentally.
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Hiroshi Suganuma, Hiroshi Suganuma, Minoru Takeda, Minoru Takeda, Michio Oka, Michio Oka, Naoto Ozaki, Naoto Ozaki, Motohisa Haga, Motohisa Haga, Shigeo R. Kubota, Shigeo R. Kubota, } "Deep-UV lithography using continuous-wave 266-nm radiation from an all solid state frequency quadrupled Nd:YAG laser", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209243; https://doi.org/10.1117/12.209243
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