26 May 1995 Fast algorithms for 3D high-NA lithography simulation
Author Affiliations +
Abstract
Partial coherent imaging in a high NA stepper is treated with the source integration method. Image formation in 3D is accomplished by the propagation and interference of plane waves. This approach allows the extensive use of FFT and leads to efficient computation of the latent image. In order to further reduce the computation time, we propose a sufficient condition for the grid density in an image plane based on the sampling theorem. Finally, we present a semi-analytical method for the modeling of post exposure bake process in 3D. With these enhancements in the algorithm, a typical 3D latent image problem can be solved in a few second on a workstation.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Qi-De Qian, Francisco A. Leon, "Fast algorithms for 3D high-NA lithography simulation", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209269; https://doi.org/10.1117/12.209269
PROCEEDINGS
9 PAGES


SHARE
Back to Top