Influence of photoresist on the optical performance of high NA steppers

Donis G. Flagello; Richard Rogoff

doi:10.1117/12.209265

26 May 1995 Influence of photoresist on the optical performance of high-NA steppers

Donis G. Flagello, Richard Rogoff

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209265
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The theoretical foundation for high NA imaging, which has been previously presented is used to examine the effects of the photoresist film on the optical performance of an advanced lithographic lens. We show that the high NA image formed by the lens within the photoresist interacts with the development process; hence, the image behavior is highly correlated to process parameters such as development and photoresist thickness. The effects of aberrations with the photoresist are explored by comparing aberrated and ideal systems. Changes in field related focal deviations and depth of focus (DOF) are shown. A general rule-of-thumb equation is formulated that relates best focus, i.e., focal plane deviation, derived from either simulations or experiments to the amount of wavefront aberrations. The relationship is extended for an approximate calculation of DOF change with aberration. Since the measurement of various amounts of aberration is dependent on the photoresist processing, definitions of best focus using testing procedures such as focus/exposure matrices, are influenced by the ability to measure optical performance.

Citation Download Citation

Donis G. Flagello and Richard Rogoff "Influence of photoresist on the optical performance of high-NA steppers", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209265

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