26 May 1995 Integrating proximity effect corrections with photomask data preparation
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Abstract
In an earlier work we demonstrated the feasibility of automated software correction for imaging and process proximity effects by precompensating mask layout data. As correction techniques and algorithms continue to be refined, it is important to deal with integrating the correction computation into the manufacturing data flow. This paper addresses issues such as computational speed, data volumes, management of the data hierarchy, and the need for geometric operations between various CAD layers within the context of a data hierarchy manager.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Oberdan W. Otto, Oberdan W. Otto, Richard C. Henderson, Richard C. Henderson, } "Integrating proximity effect corrections with photomask data preparation", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209251; https://doi.org/10.1117/12.209251
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