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26 May 1995 KrF excimer laser with repetition rates of 1 kHz for DUV lithography
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Abstract
Advanced DUV lithography tools are adapting scanning methods in order to match the increasing demands on throughput, field size, and resolution. The demands on the laser source are changing for both the reflective and the refractive Step&Scan tools. The cost-effective operation of such lithography tool requires 248 nm excimer laser with high power and repetition rates of >= 1 kHz. Precise dose control of the exposure demands not only high repetition rates but also excellent stability of the laser output energy. The combination of the new NovaTube technology laser tube design with the LITHO line narrowing optics design allows 1 kHz operation of the excimer laser with high stability.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Rainer Paetzel, Juergen Kleinschmidt, Ulrich Rebhan, Jim Franklin, and Heinrich Endert "KrF excimer laser with repetition rates of 1 kHz for DUV lithography", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209305
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