Translator Disclaimer
26 May 1995 Lithography for ULSI
Author Affiliations +
ULSI has heavily depended on develops in optical lithography. However, optical lithography is now facing a major obstacle due to exposure wavelength limitations. To overcome this obstacle, not only the use of shorter wavelengths, but also such new technologies as super-resolution techniques, electron beams, and X-ray lithography are being intensively investigated. This paper reviews recent developments in these technologies and discusses the major issues. The difference in lithographic activities between Japan and the U.S. is also discussed. Finally, recent developments in lithography for experimental 1-Gb DRAMs are presented.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shinji Okazaki "Lithography for ULSI", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995);


X-Ray Lithography: Can It Be Justified
Proceedings of SPIE (June 20 1985)
Lithography for ULSI
Proceedings of SPIE (June 09 1995)
Lithography for ULSI
Proceedings of SPIE (May 19 1995)
Lithoraphy for ULSI
Proceedings of SPIE (May 22 1995)
Present status and technical issues of x-ray lithography
Proceedings of SPIE (September 01 1998)
Sophisticated masks
Proceedings of SPIE (March 01 1991)
Precision Alignment For X-Ray Lithography
Proceedings of SPIE (June 18 1984)

Back to Top