26 May 1995 New system for fast submicron laser direct writing
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Abstract
We report on a new system for submicron lithography by fast laser direct writing, where a programmable phase modulating spatial light modulator (SLM) is imaged onto the wafer using flash on the fly exposure with an excimer laser light source. This new principle for maskless optical lithography has been investigated for the first time. A SLM with 512 X 464 pixels has been developed and fabricated using a CMOS active matrix and a reflective, deformable viscoelastic layer on top. Using this light modulator for image generation a demonstrator exposure tool for 0.6 micrometers minimum feature size has been designed and set up including all the components necessary for the exposure of a complete lithographic layer from CAD layout data. The demonstrator is shown to give good quality photoresist pattern on the wafer at a throughput of roughly one 4"-wafer per hour. Based on our experimental results we propose a tool with a throughput of nine 6"-wafers per hour and conclude that the new principle of operation has the potential of high performance optical direct writing lithography.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Heinz Kueck, Heinz Kueck, Michael Bollerott, Michael Bollerott, Wolfgang Doleschal, Wolfgang Doleschal, Andreas Gehner, Andreas Gehner, Wolfram Grundke, Wolfram Grundke, Detlef Kunze, Detlef Kunze, Rolf Melcher, Rolf Melcher, Joerg Paufler, Joerg Paufler, Rolf Seltmann, Rolf Seltmann, Guenter Zimmer, Guenter Zimmer, } "New system for fast submicron laser direct writing", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); doi: 10.1117/12.209280; https://doi.org/10.1117/12.209280
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