Role of illumination and thin film layers on the printability of defects

Robert John Socha; Andrew R. Neureuther

doi:10.1117/12.209283

26 May 1995 Role of illumination and thin film layers on the printability of defects

Robert John Socha, Andrew R. Neureuther

Author Affiliations +

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209283
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

The roles of projection printer illumination and resist/substrate layers in the printability of defects are explored in a physical based approach. In this approach the mutual coherence is first calculated, and then the impact of a defect on a feature is calculated using the image perturbation approach. The concerns are that the use of modified illumination and high NA divergence and reflection of the fields in a thin-film might affect the tendency of a defect to print. Results of this extension for various illuminations, thick resists and antireflection coatings are compared with rigorous thin-film SPLAT simulations. The mutual coherence function (MCF) was found to be strongly dependent of the type of illumination and on the mask geometry; however, the MCF was found to be weakly dependent on the presence of substrate material. This indicates that certain types of illumination sources are more defect tolerant and that the substrate is insignificant in preventing defect printing.

Citation Download Citation

Robert John Socha and Andrew R. Neureuther "Role of illumination and thin film layers on the printability of defects", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209283

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