Total overlay analysis for designing future aligner

Nobutaka Magome; Hidemi Kawai

doi:10.1117/12.209316

26 May 1995 Total overlay analysis for designing future aligner

Nobutaka Magome, Hidemi Kawai

Proceedings Volume 2440, Optical/Laser Microlithography VIII; (1995) https://doi.org/10.1117/12.209316
Event: SPIE's 1995 Symposium on Microlithography, 1995, Santa Clara, CA, United States

Abstract

We found total overlay with respect to optical lithography using an approach similar to quality control technique employed at a semiconductor factory. This approach involves an aligner performance, process quality, reticle error and overlay measurement. This paper further describes new ides for the number of machines to be used for matching and data collection period. Lastly, improvement on total overlay and a prospective view for a future aligner and its usage are also described.

Citation Download Citation

Nobutaka Magome and Hidemi Kawai "Total overlay analysis for designing future aligner", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209316

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