Translator Disclaimer
26 May 1995 Total overlay analysis for designing future aligner
Author Affiliations +
Abstract
We found total overlay with respect to optical lithography using an approach similar to quality control technique employed at a semiconductor factory. This approach involves an aligner performance, process quality, reticle error and overlay measurement. This paper further describes new ides for the number of machines to be used for matching and data collection period. Lastly, improvement on total overlay and a prospective view for a future aligner and its usage are also described.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Nobutaka Magome and Hidemi Kawai "Total overlay analysis for designing future aligner", Proc. SPIE 2440, Optical/Laser Microlithography VIII, (26 May 1995); https://doi.org/10.1117/12.209316
PROCEEDINGS
11 PAGES


SHARE
Advertisement
Advertisement
Back to Top