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22 May 1995 Stability of shape memory characteristics against cyclic deformation in Ti-Ni sputter-deposited thin films
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Abstract
The stability of the shape memory effect associated with both the R-phase and martensitic transformations was investigated in Ti-Ni sputter-deposited thin films. The R-phase transformation characteristics showed perfect stability against cyclic deformation because of the small shape change which caused no slip deformation to occur, while the martensitic transformation temperatures rose and temperature hysteresis decreased during cycling because of the formation of internal stress which is due to the introduction of dislocations. However, no slip deformation occurred during cyclic deformation under 100 MPa because of small grains so that perfect stability of shape memory effect was also observed in the martensitic transformation. Besides, with increasing the number of cycles under higher stresses, the shape memory characteristics associated with the martensitic transformation were stabilized by a training effect.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kuniaki Nomura and Shuichi Miyazaki "Stability of shape memory characteristics against cyclic deformation in Ti-Ni sputter-deposited thin films", Proc. SPIE 2441, Smart Structures and Materials 1995: Smart Materials, (22 May 1995); https://doi.org/10.1117/12.209794
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