23 January 1995 Thermally induced structural and phase transformations of Mo-Si and MoSi2-Si x-ray multilayer mirrors
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Proceedings Volume 2453, X-Ray Optics and Surface Science; (1995) https://doi.org/10.1117/12.200276
Event: X-ray Optics and Surface Science, 1994, none, Russian Federation
The effect of elevated temperatures on the structural stability of Mo - Si and MoSi2 - Si X-ray multilayer mirrors was studied. Multilayers deposited by magnetron sputtering were annealed at temperatures ranging from 300 to 1300 K. A detailed picture of the thermally induced changes in the microstructure is obtained using several techniques including small- and large-angle X-ray scattering and transmission electron microscopy. The main causes of the degradation of Mo - Si mirrors is an interdiffusion mixing of silicon and molybdenum layers and a formation of MoSi2 in both the hexagonal and tetragonal phases. The smoothening of interfaces in MoSi2 - Si mirrors and increasing of their reflectance were observed after annealing at temperatures T < 800 K. The MoSi2 - Si mirrors undergo a catastrophic degradation at T > 1000 K caused by a crystallization of amorphous Si and a recrystallization of hexagonal MoSi2.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anatoli I. Fedorenko, Anatoli I. Fedorenko, A. S. Garbuz, A. S. Garbuz, V. V. Kondratenko, V. V. Kondratenko, Yurii P. Pershin, Yurii P. Pershin, V. E. Pukha, V. E. Pukha, O. V. Poltseva, O. V. Poltseva, S. A. Yulin, S. A. Yulin, E. N. Zubarev, E. N. Zubarev, } "Thermally induced structural and phase transformations of Mo-Si and MoSi2-Si x-ray multilayer mirrors", Proc. SPIE 2453, X-Ray Optics and Surface Science, (23 January 1995); doi: 10.1117/12.200276; https://doi.org/10.1117/12.200276

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