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8 March 1995 Influence of deposition parameters on optical properties of titanium nitride thin films
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Proceedings Volume 2461, ROMOPTO '94: Fourth Conference in Optics; (1995) https://doi.org/10.1117/12.203490
Event: ROMOPTO '94: 4th Conference on Optics, 1994, Bucharest, Romania
Abstract
The thin titanium nitride films deposited on glass in a planar d.c. magnetron configuration have been optically investigated. The influence of the nitrogen partial pressure, substrate bias and film thickness as deposition parameters on the transmission (Vis) and the reflectance (Vis, FIR) spectra of the samples was studied. The analysis of surface properties of TiN films was also made by spectroscopic ellipsometry for different deposition conditions. The data were compared with the similar spectrum of a gold evaporated film.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Viorel Braic, Mariana Braic, Gabriela Pavelescu, Dorin Melinte, and Dana Necsoiu "Influence of deposition parameters on optical properties of titanium nitride thin films", Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); https://doi.org/10.1117/12.203490
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