In this paper we present results on the deposition of titanium nitride and titanium carbide films by pyrolytic laser-induced chemical vapor deposition using a cw TEM00 CO2 laser beam. TiN lines were deposited onto mild steel substrates while TiC spots were deposited on silica substrates. The microstructure of the surface and of fractured cross-sections of the films were examined by scanning electron microscopy. The topography of the films and the thickness measurements were studied both with diamond-stylus and non-contact laser profilometers. The chemical composition of the TiN films was investigated by electron probe microanalysis. X-ray diffraction was used for phase and structure analyses of the TiC films.