8 March 1995 Optical investigations of electron gun evaporated SiO2 and TiO2 thin films
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Proceedings Volume 2461, ROMOPTO '94: Fourth Conference in Optics; (1995) https://doi.org/10.1117/12.203489
Event: ROMOPTO '94: 4th Conference on Optics, 1994, Bucharest, Romania
Abstract
Films of SiO2 and TiO2 by electron gun reactive evaporation in ionized oxygen atmosphere were prepared. The optical properties: refractive index, absorptance, transmittance and stability of the films were investigated. The TiO2 films have the same refractive index as the bulk--quartz glass--1.46 and for 633 nm the absorption is negligible. The TiO2 films have refractive indexes up to 2.3 when deposited on unheated substrates (approximately 300 degree(s)C), while the absorption coefficient is less than 50 cm-1 at 633 nm. All the deposited films of SiO2 and TiO2 proved to be mechanically stable and water resistant.
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Claudian Georgescu, Claudian Georgescu, } "Optical investigations of electron gun evaporated SiO2 and TiO2 thin films", Proc. SPIE 2461, ROMOPTO '94: Fourth Conference in Optics, (8 March 1995); doi: 10.1117/12.203489; https://doi.org/10.1117/12.203489
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