This paper presents a comprehensive review of the current methods used in Liquid Phase Photo-Deposition (LPPD). After the introduction, the basic physical principles of LPPD and main technological trends of research are given. Basic requirements for photoreaction systems are described. The critical controlling LPPD parameters are described and details of experimental kinetic investigations are given. We present the theories suggested for LPPD processes and give some application results. The advantages and weaknesses of LPPD are compared to the Gas Phase Photo-Deposition processes.