1 March 1995 Laser surface processing of thin films for microelectronics applications
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Proceedings Volume 2498, Laser Methods of Surface Treatment and Modification: ALT '94 International Conference; (1995); doi: 10.1117/12.203607
Event: Laser Methods of Surface Treatment and Modification: ALT '94 International Conference, 1994, Konstanz, Germany
Abstract
Laser maskless patterning of magnetic thin films and transparent electrode films for microelectronics application has been performed to realize higher precision and higher rate processes than conventional techniques. Single crystalline ferrite and metallic alloy thin films such as FeAlSi, FeZrN, and CoZrNb have been etched without a mask in chemical solutions to realize magnetic head gap structures for future applications. Indium tin oxide (ITO) thin films on a glass substrate have been etched by laser ablation to provide a maskless patterning process for flat panel display (FPD) fabrication. Laser cleaning has been applied to a magnetic head slider and glass substrates as an alternative technique to conventional wet cleaning processes.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Mikio Takai, "Laser surface processing of thin films for microelectronics applications", Proc. SPIE 2498, Laser Methods of Surface Treatment and Modification: ALT '94 International Conference, (1 March 1995); doi: 10.1117/12.203607; https://doi.org/10.1117/12.203607
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KEYWORDS
Laser processing

Head

Magnetism

Glasses

Thin films

Etching

Microelectronics

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