31 March 1995 Process diagnostics and control for excimer laser processing
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Proceedings Volume 2502, Gas Flow and Chemical Lasers: Tenth International Symposium; (1995) https://doi.org/10.1117/12.204886
Event: Gas Flow and Chemical Lasers: Tenth International Symposium, 1994, Friedrichshafen, Germany
Abstract
The present contribution focuses on fundamental investigations and possible methods for quality and process control mechanisms, especially for the removal of thin hard films and deformation layers from metallic substrates. Extended fundamental investigations including short time photography and plasma emission spectroscopy were carried out to characterize the plasma formation and propagation during excimer laser treatment. The influence of both the laser and process parameters (wavelength, energy density, number of pulses, ambient gas type and pressure) on the process and the plasma properties is determined. The investigated plasma emission spectra is strongly correlated to the surface modifications achieved. It will be outlined how these signals can be used for process control in excimer laser assisted processing.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Karsten Schutte, Emil Schubert, Hans Wilhelm Bergmann, "Process diagnostics and control for excimer laser processing", Proc. SPIE 2502, Gas Flow and Chemical Lasers: Tenth International Symposium, (31 March 1995); doi: 10.1117/12.204886; https://doi.org/10.1117/12.204886
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