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High-precision EB technology with thin EB resist and distortion-free mask holder for x-ray mask fabrication
Development of a W/Si thin film for the single-layered attenuated phase-shifting mask for 248-nm lithography
Dependency of side-lobe effect of half-tone phase-shift mask on substrate material and topology and its solutions
Investigation and improvement of patterning characteristics for annular illumination optical lithography at the periodical pattern ends