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3 July 1995 Analysis of pattern shift error for mask clamping measured by Nikon XY-31
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Abstract
Pattern measurement repeatability of metrology tools must be evaluated precisely to warrant higher pattern placement accuracy, according to a budget of pattern shift errors effected by the initial deformation of a substrate, clamping conditions, etc. As first steps, we focused on our metrology tool, Nikon XY-3i. Pattern measurement repeatability was usually evaluated to measure a referential pattern of a single mask repeatedly. For taking tilting variations on each of mask setting into account, we divided the coordinates of measured data into some error factors. Besides, we proposed sag correction method to eliminate tilting variation for precisely evaluation. This method was effective to unify each of the referential planes on measuring. Sag correction was effective to diminish in variations of orthogonality error factor and trapezoid error factors and deviations (3(sigma) ) of measurement repeatability. Therefore, we succeeded to get the quantitative budget of measurement repeatability for our metrology tool.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shusuke Yoshitake, Kazuto Matsuki, Satoshi Yamasaki, Ryoichi Hirano, Shuichi Tamamushi, Yoji Ogawa, and Toru Tojo "Analysis of pattern shift error for mask clamping measured by Nikon XY-31", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212777
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