3 July 1995 Current technological status of spatial filtering method for soft defect detection
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Abstract
Laser-based mask inspection systems are indispensable to attaining better yield, in both the semiconductor manufacturing process and the mask manufacturing process, because of their high throughput. We describe this issue citing the operational principle of our AM-601D (A reticle particle inspection system that we manufacture, rated sensitivity: 0.5 micron), which is based on a spatial filtering method with a raster scanning of a focused laser beam.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Tsuneyuki Hagiwara, Tsuneyuki Hagiwara, } "Current technological status of spatial filtering method for soft defect detection", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212796; https://doi.org/10.1117/12.212796
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