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3 July 1995 Evaluation of CD metrology tools for photomasks for 0.25-μm devices
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Abstract
CD measurement tools to reticles for 0.25 micrometers devices are evaluated in light of the follow requirements: (1) linearity limit (or reliably measurable minimum feature size): 0.5 micrometers , (2) repeatability (3(sigma) ): less than or equal to 6 nm, (3) applicability to attenuated (or half tone) masks, and (4) automeasurement capability assisted with pattern recognition. The evaluated tools are (1) an optical CD measurement system Nikon MPA3 at g-line or e-line light, (2) a laser confocal microscope OAI SiSCANII7325 at 325 nm, and (3) a confocal- /transmission-type microscope Technical Instruments Co. KMS300T in a confocal or transmission mode with board-band illumination. The samples evaluated are (1) a low-reflective binary mask, (2) a HT mask for g-line exposure with a transmittance of 8%, and (3) a HT mask for i-line exposure with a transmittance of 8%, all having space patterns the width of which varies from 0.45 to 4.0 micrometers . In conclusion, the requirements are met by the confocal microscopes (SiSCANII7325 and KMS300T in a confocal mode).
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hiroshi Fujita, Shiho Sasaki, Hiroyuki Miyashita, Naoya Hayashi, and Hisatake Sano "Evaluation of CD metrology tools for photomasks for 0.25-μm devices", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212780
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