3 July 1995 Mask metrology system XY-5i for 256-Mbit DRAM
Author Affiliations +
As semiconductor LSI has become highly more integrated and its chip's pattern has become much finer, it shall be demanded in mask production to position the pattern even more accurately than ever. To meet the mask metrology requirements for future LSI designs, Nikon Corporation has developed the XY-5i. In this paper, first, we present the required accuracy for reticle and the required accuracy for the metrology system in each DRAM generation. Then we present the main specifications of the XY-5i. Second, we will explain the new technologies which are introduced so as to improve the coordinate measurement repeatability. And the performance will be demonstrated with actual measurement data from the XY-5i. Third, we will explain the new flexure compensation and the mirror bow compensation, which are introduced in order to improve coordinate nominal accuracy. The effectiveness of these compensations is shown with actual data in this paper.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eiji Matsubara, Yoshihisa Fujita, Taro Ototake, "Mask metrology system XY-5i for 256-Mbit DRAM", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212760; https://doi.org/10.1117/12.212760


Progress in the ASML EUV program
Proceedings of SPIE (May 20 2004)
Absolute pattern placement metrology on wafers
Proceedings of SPIE (August 04 1993)
Photomask film degradation effects in the wafer fab how...
Proceedings of SPIE (November 08 2012)
Effect of reticle CD uniformity on wafer CD uniformity in...
Proceedings of SPIE (December 18 1998)
Impact of mask CDU and local CD variation on intra...
Proceedings of SPIE (November 08 2012)

Back to Top