Photomask blanks enhancement for the laser reticle writer

Hideo Kobayashi; Keishi Asakawa; Yasunori Yokoya

doi:10.1117/12.212790

3 July 1995 Photomask blanks enhancement for the laser reticle writer

Hideo Kobayashi, Keishi Asakawa, Yasunori Yokoya

Proceedings Volume 2512, Photomask and X-Ray Mask Technology II; (1995) https://doi.org/10.1117/12.212790
Event: Photomask Japan 1995, 1995, Kanagawa, Japan

Abstract

The laser writer (CORE) has come to the front for advanced reticle fabrication so that photomask blanks enhancement is much more to be desired for the application. We have investigated novel techniques to bring out photomask blanks potential to expand process windows for the laser writer application, which included optimization of resist coating thickness by studying standing wave effect, optimization of soft-baking by studying resist behavior to soft-baking temperature, and optimization of pretreatment by studying resist adhesion characteristic to chromium oxide based film and molybdenum silicide based film. We have also explored very basic features of several resists in a comparison between the most popular OCG-895i and new candidates under an optimized coating thickness and soft-baking temperature respectively for each resist. This paper describes details of our findings on novel techniques for photomask blanks enhancement, and a comparison result of several resists in very basic features, in order to expand process windows to meet critical dimension performance requirements of advanced reticle fabrication by the laser writer.

Citation Download Citation

Hideo Kobayashi, Keishi Asakawa, and Yasunori Yokoya "Photomask blanks enhancement for the laser reticle writer", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); https://doi.org/10.1117/12.212790

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