3 July 1995 Quality control of embedded-type phase-shift mask
Author Affiliations +
Abstract
We have been developing the technology for phase shift masks since 1991 in order to supply the reticles for 64 MDRAM generation and after. We are still developing both the alternative and embedded types fori-line. The embedded type is suitable for ASIC and contact hole. Now, we are reaching an adequate supply of embedded type PSMs for practical use. Currently the embedded types is relatively popular because the burden on designing is small, the process is comparatively short, and defect repair is easier.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yoshiro Yamada, Yoshiro Yamada, Kazuaki Chiba, Kazuaki Chiba, Eisei Karikawa, Eisei Karikawa, Hiromasa Unno, Hiromasa Unno, Yasutaka Kikuchi, Yasutaka Kikuchi, Katsuhiro Kinemura, Katsuhiro Kinemura, Masao Otaki, Masao Otaki, } "Quality control of embedded-type phase-shift mask", Proc. SPIE 2512, Photomask and X-Ray Mask Technology II, (3 July 1995); doi: 10.1117/12.212785; https://doi.org/10.1117/12.212785
PROCEEDINGS
2 PAGES


SHARE
RELATED CONTENT

Alt PSM of contact with phase assist feature for 65...
Proceedings of SPIE (December 26 2002)
Study of loading effect on dry etching process
Proceedings of SPIE (August 27 2003)
Actual use of phase-shift mask
Proceedings of SPIE (December 07 1995)

Back to Top