Paper
20 June 1995 Multilayer structures for high-performance hard x-ray optics
Eleonora M. Witteles, R. D. Nelson, H. Dasarathy, Brian D. Ramsey, Jeffery J. Kolodziejczak
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Abstract
X-ray optics typically rely on total external reflection and for hard x rays, the critical angle in any material becomes very small. This in turn leads to vanishingly small projected areas. To extend useful reflectivity to higher energies, the concept of multilayer coated reflectors has been proposed. Such hard x-ray multilayer structures require the capability to deposit ultra- thin (of the order of ten angstrom), ultra-smooth (of the order of a few angstroms rms), uniform, alternating films of high Z and low Z materials, with sharp interfaces and no interdiffusion between the layers. Standard vapor phase deposition processes such as evaporation and sputtering cannot achieve all the above goals. We have developed a new deposition process which does not involve the use of vacuum, is performed at a relatively low temperature, can be scaled up to large surface areas and to curved substrates, is low cost, and results in ultra thin, ultra smooth, uniform, high density films with sharp interfaces. This is optimal for the construction of multilayer x-ray optical components. This process is also capable of depositing films of high melting point noble metals such as iridium and osmium which cannot be deposited by evaporative procedures. The surface characterization and x-ray reflectivity of the films are presented.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Eleonora M. Witteles, R. D. Nelson, H. Dasarathy, Brian D. Ramsey, and Jeffery J. Kolodziejczak "Multilayer structures for high-performance hard x-ray optics", Proc. SPIE 2515, X-Ray and Extreme Ultraviolet Optics, (20 June 1995); https://doi.org/10.1117/12.212614
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KEYWORDS
Multilayers

Silicon

Reflectivity

Deposition processes

Gold

Hard x-rays

Interfaces

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