25 September 1995 Chemical state mapping on material surfaces with the X1A second-generation scanning photoemission microscope (X1A SPEM-II)
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Abstract
The second generation scanning photoelectron microscope at beamline X1A of the National Synchrotron Light Source (X1A SPEM-II) is designed for spatially resolved elemental and chemical analysis by x ray photoelectron spectroscopy (XPS) on material surfaces. This microscope can focus photon energies between 300 to 800 eV with submicron spatial resolution. Multiple photoelectron images can be acquired simultaneously with the use of a hemispherical sector analyzer (HSA) with multi-channel detection (MCD), which enables a technique called 'parallel imaging for chemical state mapping' (PICSM). The PICSM technique was demonstrated using a Si/SiO2 pattern.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Cheng-Hao Ko, Cheng-Hao Ko, Janos Kirz, Janos Kirz, Klaus Maier, Klaus Maier, Barry L. Winn, Barry L. Winn, Harald Ade, Harald Ade, Steven L. Hulbert, Steven L. Hulbert, Erik D. Johnson, Erik D. Johnson, Erik H. Anderson, Erik H. Anderson, } "Chemical state mapping on material surfaces with the X1A second-generation scanning photoemission microscope (X1A SPEM-II)", Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); doi: 10.1117/12.221668; https://doi.org/10.1117/12.221668
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