Microfocusing 4-keV to 65-keV xrays with bent Kirkpatrick-Baez mirrors

Peter J. Eng; Mark L. Rivers; Bingxin X. Yang; Wilfried Schildkamp

doi:10.1117/12.221682

25 September 1995 Microfocusing 4-keV to 65-keV xrays with bent Kirkpatrick-Baez mirrors

Peter J. Eng, Mark L. Rivers, Bingxin X. Yang, Wilfried Schildkamp

Proceedings Volume 2516, X-Ray Microbeam Technology and Applications; (1995) https://doi.org/10.1117/12.221682
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

We present the test results of micro-focusing a continuous spectrum (4 KeV - 65 keV) of x rays using two, 100 mm long, actively bent mirrors in a Kirkpatrick-Baez geometry. The mirrors are figured by applying in situ two different moments on the ends resulting in a surface figure that approximates an ellipse. We have demonstrated the ability to doubly focus NSLS bending magnet x rays from 4 KeV to 13 KeV to a spot size less than 4 microns in diameter with a net gain of 2000 over a similar size beam produced with slits. In the bending magnet test the beam was focused in the vertical direction with a high quality rhodium coated Si mirror with a rms surface roughness and slope error less than 2 angstrom and 2 (mu) rad, respectively. The horizontal mirror consisted of uncoated float glass with significantly greater roughness and slope error. This combination of mirrors worked extremely well, pointing the direction for inexpensive micro-focusing optics. Vertical focusing tests were also performed using only the high quality Si mirror. On the bending magnet, x rays were focused to 30 KeV using an incidence angle of 2 mrad achieving a best focus of 2.5 microns FWHM, resulting in a net gain of 91. Additional high energy focusing tests were carried out at the NSLS superconducting wiggler beamline X17. In this case a continuous x-ray spectrum was vertically focused using the Si mirror with an energy cutoff of 65 KeV (at an incident angle of 1 mrad) achieving a focal spot size of 3.3 microns FWHM and a net gain of 20.

Citation Download Citation

Peter J. Eng, Mark L. Rivers, Bingxin X. Yang, and Wilfried Schildkamp "Microfocusing 4-keV to 65-keV xrays with bent Kirkpatrick-Baez mirrors", Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); https://doi.org/10.1117/12.221682

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