25 September 1995 Microfocusing optics for hard xrays fabricated by x-ray lithography
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Abstract
Lithographic techniques for fabrication of hard x-ray Fresnel zone plates are discussed. Practical results achieved at the Center for X-ray Lithography of the University of Wisconsin- Madison are presented. Fabrication technology includes replication of an e-beam written master mask into a thick photoresist by synchrotron radiation x-ray lithography, and subsequent electroplating of a metal zone plate structure using photoresist pattern as a mold.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Azalia A. Krasnoperova, Azalia A. Krasnoperova, Zheng Chen, Zheng Chen, Franco Cerrina, Franco Cerrina, Enzo M. Di Fabrizio, Enzo M. Di Fabrizio, Massimo Gentili, Massimo Gentili, Wenbing Yun, Wenbing Yun, Barry P. Lai, Barry P. Lai, Efim S. Gluskin, Efim S. Gluskin, } "Microfocusing optics for hard xrays fabricated by x-ray lithography", Proc. SPIE 2516, X-Ray Microbeam Technology and Applications, (25 September 1995); doi: 10.1117/12.221670; https://doi.org/10.1117/12.221670
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