Electron-optical design for the SCALPEL proof-of-concept tool

Warren K. Waskiewicz; Steven D. Berger; Lloyd R. Harriott; Masis M. Mkrtchyan; Stephen W. Bowler; J. M. Gibson

doi:10.1117/12.221577

25 September 1995 Electron-optical design for the SCALPEL proof-of-concept tool

Warren K. Waskiewicz, Steven D. Berger, Lloyd R. Harriott, Masis M. Mkrtchyan, Stephen W. Bowler, J. M. Gibson

Author Affiliations +

Proceedings Volume 2522, Electron-Beam Sources and Charged-Particle Optics; (1995) https://doi.org/10.1117/12.221577
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

A proof-of-concept experimental lithography tool, based upon the SCALPEL^TM principle, is currently being fabricated at AT&T Bell Laboratories. Designed from a lithographic system perspective, we feel that this experimental platform is the minimal configuration necessary to evaluate this specific printing technique, consistent with design rules from 0.18 micrometers to 0.09 micrometers . Details of the machine's electron-optics are presented, including the calculated performance of the electromagnetic lens systems. The critical lithography issues which will be examined using this tool are also discussed.

Citation Download Citation

Warren K. Waskiewicz, Steven D. Berger, Lloyd R. Harriott, Masis M. Mkrtchyan, Stephen W. Bowler, and J. M. Gibson "Electron-optical design for the SCALPEL proof-of-concept tool", Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995); https://doi.org/10.1117/12.221577

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