25 September 1995 Electron-optical design for the SCALPEL proof-of-concept tool
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A proof-of-concept experimental lithography tool, based upon the SCALPELTM principle, is currently being fabricated at AT&T Bell Laboratories. Designed from a lithographic system perspective, we feel that this experimental platform is the minimal configuration necessary to evaluate this specific printing technique, consistent with design rules from 0.18 micrometers to 0.09 micrometers . Details of the machine's electron-optics are presented, including the calculated performance of the electromagnetic lens systems. The critical lithography issues which will be examined using this tool are also discussed.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Warren K. Waskiewicz, Warren K. Waskiewicz, Steven D. Berger, Steven D. Berger, Lloyd R. Harriott, Lloyd R. Harriott, Masis M. Mkrtchyan, Masis M. Mkrtchyan, Stephen W. Bowler, Stephen W. Bowler, J. M. Gibson, J. M. Gibson, "Electron-optical design for the SCALPEL proof-of-concept tool", Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995); doi: 10.1117/12.221577; https://doi.org/10.1117/12.221577


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