Thermal field emission sources and optics for Gaussian electron-beam lithography

Tom Chisholm; Bernard A. Wallman; Johannes C. Romijn

doi:10.1117/12.221595

25 September 1995 Thermal field emission sources and optics for Gaussian electron-beam lithography

Tom Chisholm, Bernard A. Wallman, Johannes C. Romijn

Author Affiliations +

Proceedings Volume 2522, Electron-Beam Sources and Charged-Particle Optics; (1995) https://doi.org/10.1117/12.221595
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

The use of Schottky emitters has enabled the designers of Gaussian vector-scan e-beam lithography equipment to meet the ever more stringent demands of the semiconductor industry. Although these emitters are expensive, their long life means that they are economical in total cost. Measurements of the influence of noise on the drives to each element of the Leica EBPG- 5FE column show that the only critical parts are the beam alignment units. Stable, low-noise drivers allow the beam positional noise to be within acceptable limits. A numerical technique has been developed to compute the total spot-size in the presence of spherical and chromatic aberrations and this allows the efficiency of the automatic spot optimization routines of the EBPG-5FE to be examined. The present emitter in the EBPG-5FE in DIMES has been in operation since August 1993 and stable and reproducible performance is obtained. The machine is in constant use for a wide range of tasks.

Citation Download Citation

Tom Chisholm, Bernard A. Wallman, and Johannes C. Romijn "Thermal field emission sources and optics for Gaussian electron-beam lithography", Proc. SPIE 2522, Electron-Beam Sources and Charged-Particle Optics, (25 September 1995); https://doi.org/10.1117/12.221595

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