Developments of a high-power, low-contamination laser-plasma source for EUV projection lithography

Leonid A. Shmaenok; Fred Bijkerk; C. Bruineman; R. K. F. Bastiaensen; Alexander P. Shevelko; Dmitrii M. Simanovski; A. N. Gladskikh; Sergei V. Bobashev

doi:10.1117/12.220971

18 September 1995 Developments of a high-power, low-contamination laser-plasma source for EUV projection lithography

Leonid A. Shmaenok, Fred Bijkerk, C. Bruineman, R. K. F. Bastiaensen, Alexander P. Shevelko, Dmitrii M. Simanovski, A. N. Gladskikh, Sergei V. Bobashev

Author Affiliations +

Proceedings Volume 2523, Applications of Laser Plasma Radiation II; (1995) https://doi.org/10.1117/12.220971
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

Results on laser plasma EUV characteristics for various target materials and irradiation conditions are presented. Spectra of high-Z elements in the 12.5-15.4 nm range from plasmas generated with a high-power KrF laser at 2 X 10¹² W/cm² were measured. The highest conversion efficiency (CE) of 0.85% in 2% BW was found for Re near 13.6 nm, corresponding to a maximal EUV power of 550 mW in 2% BW at 50 Hz. The use of two successive laser pulses, investigated with 2.5 ns pulses of 0.53 micrometers radiation at (0.5-1) X 10¹³, resulted in an increase of the CE by a factor of 1.8-2.3 for the second pulse at specific delay values (6 and 12 ns for W). The total CE gain amounted to 1.4-2. The first demonstration of an alternative concept of a laser plasma raget for EUVL was performed, based on the usage of a centrufugal force for elimination of particluates. The principle of the approach is generation of laser plasmas at the edge of a fastly-rotating disc. The effect of re- direction of particulates was observed in experiments with a (phi) 50 mm Ta disc at 36.000 rpm at laser power densitites between 10⁹ and 10¹¹ W/cm².

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Leonid A. Shmaenok, Fred Bijkerk, C. Bruineman, R. K. F. Bastiaensen, Alexander P. Shevelko, Dmitrii M. Simanovski, A. N. Gladskikh, and Sergei V. Bobashev "Developments of a high-power, low-contamination laser-plasma source for EUV projection lithography", Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); https://doi.org/10.1117/12.220971

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