18 September 1995 High-power excimer laser-generated plasma source for x-ray microlithography
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This paper describes a high-intensity, high pulse-repetition-rate picosecond-pulse excimer laser system and plasma x-ray source, which generates up to 3 W of average x-ray power, into 2(pi) steradians, in a spectral band from 10-16 angstrom. The XeCl excimer laser system output, at 308 nm, consists of a train of 16 pulses, each approximately 45 ps in duration and spaced by 2 ns. The energy of each pulse in the train is approximately 25 mJ, and the pulse-train repetition rate is 60 Hz. Each pulse in the train is focused to a spot of < 10 micrometers diameter on a metal tape target, resulting in an intensity of 1 X 1015 W cm-2. Spectral and spatial characteristics of the x-ray emission have been studied, and the laser energy to x-ray dose conversion efficiency has been measured in an experiment which simulates the x-ray lithography process. Lithographic efficiencies of 5.9% and 10.9% have been measured for copper and stainless steel targets, respectively.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Harry Shields, Michael F. Powers, I. C. Edmond Turcu, Ian N. Ross, Juan R. Maldonado, Philip G. Burkhalter, D. A. Newman, "High-power excimer laser-generated plasma source for x-ray microlithography", Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); doi: 10.1117/12.220972; https://doi.org/10.1117/12.220972


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