18 September 1995 Prospects for granular x-ray lithography sources
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Abstract
This paper describes the status of x-ray sources suitable for granular x-ray lithography systems (systems that require low initial investment). The key factors that determine the feasibility of point sources utilizing x-ray generation by heated plasmas (pinched gas, laser, x-pinch) will be described. In particular, the relationship between x-ray source power, required device overlay, and wafer throughput requirements for a production worthy system will be presented. In addition, relevant issues concerning the suitability of the different x-ray point source technologies for x-ray lithography applications will be discussed. Considerations for x-ray collimators will be presented in an appendix.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juan R. Maldonado, Juan R. Maldonado, "Prospects for granular x-ray lithography sources", Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); doi: 10.1117/12.220968; https://doi.org/10.1117/12.220968
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