This paper describes the status of x-ray sources suitable for granular x-ray lithography systems (systems that require low initial investment). The key factors that determine the feasibility of point sources utilizing x-ray generation by heated plasmas (pinched gas, laser, x-pinch) will be described. In particular, the relationship between x-ray source power, required device overlay, and wafer throughput requirements for a production worthy system will be presented. In addition, relevant issues concerning the suitability of the different x-ray point source technologies for x-ray lithography applications will be discussed. Considerations for x-ray collimators will be presented in an appendix.