18 September 1995 Prospects for granular x-ray lithography sources
Author Affiliations +
This paper describes the status of x-ray sources suitable for granular x-ray lithography systems (systems that require low initial investment). The key factors that determine the feasibility of point sources utilizing x-ray generation by heated plasmas (pinched gas, laser, x-pinch) will be described. In particular, the relationship between x-ray source power, required device overlay, and wafer throughput requirements for a production worthy system will be presented. In addition, relevant issues concerning the suitability of the different x-ray point source technologies for x-ray lithography applications will be discussed. Considerations for x-ray collimators will be presented in an appendix.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Juan R. Maldonado, Juan R. Maldonado, "Prospects for granular x-ray lithography sources", Proc. SPIE 2523, Applications of Laser Plasma Radiation II, (18 September 1995); doi: 10.1117/12.220968; https://doi.org/10.1117/12.220968


Lithography for ULSI
Proceedings of SPIE (May 25 1995)
Laser Plasma X-Ray Source Optimization For Lithography
Proceedings of SPIE (August 08 1983)
Recent developments of x-ray lithography in Canada
Proceedings of SPIE (July 31 1991)
Bright Discharge Plasma Sources For X-Ray Lithography
Proceedings of SPIE (June 19 1985)

Back to Top