23 August 1995 Atmospheric rf plasma coating of indium and tin oxide films
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Abstract
Indium tin oxide (ITO) thin films on soda-lime-silicate (SLS) and silica glasses were fabricated using an rf plasma mist deposition process. SEM analysis showed that the ITO films consisted of uniform particle size with a size ranging from 50 to 200 nm. XRD revealed that In2O3 phase is present in the film when In:Sn ratio is 5:5 and higher. The resistivity of the ITO films was between 1 - 10 ohm-cm. The structural change near the surface of the glass was investigated by DRIFT (diffuse reflectance infrared Fourier transform) spectroscopy. The infrared results indicated that the structure near the surface was significantly changed with higher indium concentration. The coating materials create non-bridging oxygen near the surfaces. The effects of deposition time and substrate temperature were also studied.
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James A.A. Williams, D. H. Lee, Khanh D. Vuong, Eric W. Tenpas, Victor Wu, R. Moss, Robert A. Condrate, Xing Wu Wang, "Atmospheric rf plasma coating of indium and tin oxide films", Proc. SPIE 2531, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIV, (23 August 1995); doi: 10.1117/12.217342; https://doi.org/10.1117/12.217342
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