Paper
23 August 1995 Direct observation of the structure of nickel oxide electrochromic thin films by HRTEM
Kazuki Yoshimura, Takeshi Miki, Sakae Tanemura
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Abstract
To investigate the microstructure of nickel oxide electrochromic films, cross-sectional observation of sputtered nickel oxide film was performed using a high resolution electron microscope. Lattice and atomic image could be observed for an as-deposited sample and a bleached sample. These images showed that crystallized NiO exists in both samples. As- deposited film contained a small amount of Ni2O3. One of [111] axis shrank about 3% and the lattice was a little bit strained in the bleached state. The fact that no trace of Ni(OH)2 or other species was observed implies that the boundary and surface of NiO microcrystallites played an important role in the electrochromic reaction.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kazuki Yoshimura, Takeshi Miki, and Sakae Tanemura "Direct observation of the structure of nickel oxide electrochromic thin films by HRTEM", Proc. SPIE 2531, Optical Materials Technology for Energy Efficiency and Solar Energy Conversion XIV, (23 August 1995); https://doi.org/10.1117/12.217325
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KEYWORDS
Nickel

Oxides

Crystals

Diffraction

Thin films

Transmittance

Image resolution

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