22 September 1995 Photolithography transfer setup for periodic and nonperiodic masks
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Abstract
Using the modal theory of perfectly conducting and finite conductivity lamellar gratings adapted to stratified media encountered in photolithographic transfer set-ups, we investigate a mounting patented 15 years ago and designed to obtain a faithful reproduction of a masks pierced with periodically distributed slits. We make a systematic study of the influence of the various parameters (incidence, mark-space ratio, groove spacing, groove depth, polarization, conductivity of the metal) on the field map below the mask. We discover a large tolerance over the parameters around the values stated in the patent. The result is that the set-up described in the patent can be used for duplicating non-periodic masks (e. g. linear Fresnel zone plates) as well as chirped gratings or gratings with non rectilinear grooves. Experiments have confirmed that predictions. Keywords: Grating mask transfer; Photolithography.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michel Neviere, Michel Neviere, Frederic Montiel, Frederic Montiel, Olivier M. Parriaux, Olivier M. Parriaux, } "Photolithography transfer setup for periodic and nonperiodic masks", Proc. SPIE 2532, Application and Theory of Periodic Structures, (22 September 1995); doi: 10.1117/12.221218; https://doi.org/10.1117/12.221218
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