22 September 1995 Photolithography transfer setup for periodic and nonperiodic masks
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Using the modal theory of perfectly conducting and finite conductivity lamellar gratings adapted to stratified media encountered in photolithographic transfer set-ups, we investigate a mounting patented 15 years ago and designed to obtain a faithful reproduction of a masks pierced with periodically distributed slits. We make a systematic study of the influence of the various parameters (incidence, mark-space ratio, groove spacing, groove depth, polarization, conductivity of the metal) on the field map below the mask. We discover a large tolerance over the parameters around the values stated in the patent. The result is that the set-up described in the patent can be used for duplicating non-periodic masks (e. g. linear Fresnel zone plates) as well as chirped gratings or gratings with non rectilinear grooves. Experiments have confirmed that predictions. Keywords: Grating mask transfer; Photolithography.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Michel Neviere, Michel Neviere, Frederic Montiel, Frederic Montiel, Olivier M. Parriaux, Olivier M. Parriaux, "Photolithography transfer setup for periodic and nonperiodic masks", Proc. SPIE 2532, Application and Theory of Periodic Structures, (22 September 1995); doi: 10.1117/12.221218; https://doi.org/10.1117/12.221218

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