Paper
1 September 1995 Multiple particle technique for determination of differential scattering cross section of very small surface bound particles
John C. Stover, Marvin L. Bernt
Author Affiliations +
Abstract
Measurement of small particle contamination, via laser particle scanners, is an important tool for maximizing throughput in semiconductor production lines. As line widths shrink, the required minimum observable particle diameter drops in proportion. Unfortunately, the scatter signal from a small particle on a surface falls off very quickly with decreased diameter, even faster than would be predicted by a simple Rayleigh scatter model of an isolated particle. This paper reviews a technique to measure the differential scattering cross-section of very small surface bound particles. The objective is to provide a means of obtaining data for producing the next generation of particle scanners.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
John C. Stover and Marvin L. Bernt "Multiple particle technique for determination of differential scattering cross section of very small surface bound particles", Proc. SPIE 2541, Optical Scattering in the Optics, Semiconductor, and Computer Disk Industries, (1 September 1995); https://doi.org/10.1117/12.218326
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CITATIONS
Cited by 1 scholarly publication.
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KEYWORDS
Particles

Scattering

Bidirectional reflectance transmission function

Air contamination

Scanners

Silicon

Semiconducting wafers

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