6 September 1995 Challenges to optomechanical design from x-ray interferometry and gamma-ray diffraction
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Abstract
Optical determination of the spatial period of monocrystalline silicon is a first step toward such diverse goals as an atom-based replacement for the artifact kilogram, reckoning the masses of certain elementary particles, and measurement of the molar Planck constant. The needed measurements are realized through microfringe interferometric precision with a presently achievable accuracy of the order ot 0.01 ppm. Application of such subnanometer standards to x-ray and particulary gamma-ray wavelength measurement requires accurate interferometric angle measurement nowadays effective at the sub-milli-arcsecond level. From results obtained to date, one can infer certain constraints on the future direction of subpicometer interferometry and sub-milli-arcsecond goniometry.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Richard D. Deslattes, E. G. Kessler, "Challenges to optomechanical design from x-ray interferometry and gamma-ray diffraction", Proc. SPIE 2542, Optomechanical and Precision Instrument Design, (6 September 1995); doi: 10.1117/12.218683; https://doi.org/10.1117/12.218683
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